Invention Grant
US08130364B2 Projection optical apparatus, exposure method and apparatus, photomask, and device and photomask manufacturing method 有权
投影光学装置,曝光方法和装置,光掩模,装置和光掩模制造方法

Projection optical apparatus, exposure method and apparatus, photomask, and device and photomask manufacturing method
Abstract:
When forming a magnified image of a mask pattern on an object with a plurality of projection optical systems, projected images of the projection optical systems are formed to be accurately continuous to enable satisfactory pattern transfer. A first projection optical system directs light beam from point a on a mask to point A on a plate and forms a magnified image of the mask on the plate. A second projection optical system directs light beam from point b on the mask to point on the plate and forms a magnified image of the mask on the plate. A first line segment linking point A and point a′, which orthogonally projects point a on the plate, and a second line segment linking point B and point b′, which orthogonally projects point b on the plate PT, overlap each other as viewed in a non-scanning direction.
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