Invention Grant
US08130364B2 Projection optical apparatus, exposure method and apparatus, photomask, and device and photomask manufacturing method
有权
投影光学装置,曝光方法和装置,光掩模,装置和光掩模制造方法
- Patent Title: Projection optical apparatus, exposure method and apparatus, photomask, and device and photomask manufacturing method
- Patent Title (中): 投影光学装置,曝光方法和装置,光掩模,装置和光掩模制造方法
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Application No.: US12000074Application Date: 2007-12-07
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Publication No.: US08130364B2Publication Date: 2012-03-06
- Inventor: Masato Kumazawa , Hitoshi Hatada
- Applicant: Masato Kumazawa , Hitoshi Hatada
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03B27/42 ; G03B27/52

Abstract:
When forming a magnified image of a mask pattern on an object with a plurality of projection optical systems, projected images of the projection optical systems are formed to be accurately continuous to enable satisfactory pattern transfer. A first projection optical system directs light beam from point a on a mask to point A on a plate and forms a magnified image of the mask on the plate. A second projection optical system directs light beam from point b on the mask to point on the plate and forms a magnified image of the mask on the plate. A first line segment linking point A and point a′, which orthogonally projects point a on the plate, and a second line segment linking point B and point b′, which orthogonally projects point b on the plate PT, overlap each other as viewed in a non-scanning direction.
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