Invention Grant
US08130908B2 X-ray diffraction apparatus and technique for measuring grain orientation using x-ray focusing optic
有权
X射线衍射装置和使用x射线聚焦光学元件测量晶粒取向的技术
- Patent Title: X-ray diffraction apparatus and technique for measuring grain orientation using x-ray focusing optic
- Patent Title (中): X射线衍射装置和使用x射线聚焦光学元件测量晶粒取向的技术
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Application No.: US12710827Application Date: 2010-02-23
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Publication No.: US08130908B2Publication Date: 2012-03-06
- Inventor: Huapeng Huang , Alexei Vershinin
- Applicant: Huapeng Huang , Alexei Vershinin
- Applicant Address: US NY East Greenbrush
- Assignee: X-Ray Optical Systems, Inc.
- Current Assignee: X-Ray Optical Systems, Inc.
- Current Assignee Address: US NY East Greenbrush
- Agency: Heslin Rothenberg Farley & Mesiti P.C.
- Agent Jeff Klembczyk, Esq.; Kevin P. Radigan, Esq.
- Main IPC: G01N23/207
- IPC: G01N23/207
Abstract:
An x-ray diffraction apparatus for measuring crystal orientation of a multiple grain sample. An x-ray excitation path is provided having a focusing optic for collecting x-rays from an x-ray source and redirecting the collected x-rays into an x-ray beam converging on a single grain of the multiple grain sample. At least one point detector and the sample are rotated relative to each other; and a grain orientation is obtained based upon diffraction patterns collected from first and second grain crystal planes within the apparatus.
Public/Granted literature
- US20110038457A1 X-RAY DIFFRACTION APPARATUS AND TECHNIQUE FOR MEASURING GRAIN ORIENTATION USING X-RAY FOCUSING OPTIC Public/Granted day:2011-02-17
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