Invention Grant
US08132130B2 Method, program product and apparatus for performing mask feature pitch decomposition for use in a multiple exposure process
有权
用于进行多次曝光处理中使用的掩模特征间距分解的方法，程序产品和装置
- Patent Title: Method, program product and apparatus for performing mask feature pitch decomposition for use in a multiple exposure process
- Patent Title (中): 用于进行多次曝光处理中使用的掩模特征间距分解的方法，程序产品和装置
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Application No.: US11472544Application Date: 2006-06-22
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Publication No.: US08132130B2Publication Date: 2012-03-06
- Inventor: Jang Fung Chen , Duan-Fu Stephen Hsu , Douglas Van Den Broeke , Thomas Laidig
- Applicant: Jang Fung Chen , Duan-Fu Stephen Hsu , Douglas Van Den Broeke , Thomas Laidig
- Applicant Address: NL Veldhoven
- Assignee: ASML Masktools B.V.
- Current Assignee: ASML Masktools B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G06F17/50
- IPC: G06F17/50
Abstract:
A method for forming exposure masks for imaging a target pattern having features to be imaged on a substrate in a multi-exposure process. The method includes the steps of generating a set of decomposition rules defining whether a given feature of the target pattern is assigned to a first exposure mask or a second exposure mask; applying the decomposition rules to each of the features in the target pattern so as to assign each of the features in the target pattern to one of the first exposure mask or second exposure mask; and generating the first exposure mask and the second exposure mask containing the respective features assigned to each mask.
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