Invention Grant
- Patent Title: Circuit board process
- Patent Title (中): 电路板工艺
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Application No.: US12433436Application Date: 2009-04-30
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Publication No.: US08132320B2Publication Date: 2012-03-13
- Inventor: Chien-Hao Wang
- Applicant: Chien-Hao Wang
- Applicant Address: TW Kaohsiung
- Assignee: Advanced Semiconductor Engineering, Inc.
- Current Assignee: Advanced Semiconductor Engineering, Inc.
- Current Assignee Address: TW Kaohsiung
- Agency: J.C. Patents
- Priority: TW97119946A 20080529
- Main IPC: H05K3/02
- IPC: H05K3/02 ; H05K3/10 ; H05K1/00 ; H01R43/00

Abstract:
A circuit board process is provided. In the circuit board process, a first substrate and a second substrate are stacked to form a cavity for accommodating chips. The top of the cavity is covered by a third metal layer that serves as a mask. The first substrate has a base, a first metal layer, a second metal layer, and at least a first conductive structure, and the first metal layer is patterned to form a first circuit layer having a number of first pads. The second substrate, at least an insulation layer and a third metal layer are laminated to the first substrate with a common opening in-between, and the third metal layer covers the common opening. A third circuit layer having a number of third pads is formed on the second substrate. The first pads and the third pads are not on a same plane for wire bonding.
Public/Granted literature
- US20090294027A1 CIRCUIT BOARD PROCESS Public/Granted day:2009-12-03
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