Invention Grant
- Patent Title: Method for making embedded circuit structure
- Patent Title (中): 制作嵌入式电路结构的方法
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Application No.: US12190602Application Date: 2008-08-13
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Publication No.: US08132321B2Publication Date: 2012-03-13
- Inventor: Yi-Chun Liu , Wei-Ming Cheng , Tsung-Yuan Chen , Shu-Sheng Chiang
- Applicant: Yi-Chun Liu , Wei-Ming Cheng , Tsung-Yuan Chen , Shu-Sheng Chiang
- Applicant Address: TW Kwei-San Industrial Zone, Taoyuan
- Assignee: Unimicron Technology Corp.
- Current Assignee: Unimicron Technology Corp.
- Current Assignee Address: TW Kwei-San Industrial Zone, Taoyuan
- Agent Winston Hsu; Scott Margo
- Main IPC: H01K3/10
- IPC: H01K3/10

Abstract:
An embedded structure of circuit board is provided. The embedded structure includes a substrate, a first patterned conductive layer disposed on the substrate and selectively exposing the substrate, a first dielectric layer covering the first patterned conductive layer and the substrate, a pad opening disposed in the first dielectric layer, and a via disposed in the pad opening and exposing the first patterned conductive layer, wherein the outer surface of the first dielectric layer has a substantially even surface.
Public/Granted literature
- US20100038124A1 EMBEDDED STRUCTURE AND METHOD FOR MAKING THE SAME Public/Granted day:2010-02-18
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