Invention Grant
- Patent Title: Liquid discharge head and method of manufacturing the same
- Patent Title (中): 液体排放头及其制造方法
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Application No.: US12639637Application Date: 2009-12-16
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Publication No.: US08132896B2Publication Date: 2012-03-13
- Inventor: Satoshi Oikawa , Osamu Morita
- Applicant: Satoshi Oikawa , Osamu Morita
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon USA Inc IP Division
- Priority: JP2008-324478 20081219
- Main IPC: B41J2/05
- IPC: B41J2/05

Abstract:
A liquid discharge head includes a liquid discharge substrate including a discharge port for discharging liquid, and a flow path member including a transparent member that is transparent to a laser beam, an absorption member capable of absorbing a laser beam, and a flow path for supplying liquid to the liquid discharge substrate, wherein the flow path is formed between the transparent member and the absorption member by emitting a laser beam toward a flow path portion of the absorption member constituting a portion of a wall of the flow path and toward a periphery of the flow path portion through the transparent member and thereby welding the transparent member and the absorption member at the periphery of the flow path portion, and wherein the flow path portion includes an inclined surface inclined with respect to a direction of the laser beam that has passed through the transparent member.
Public/Granted literature
- US20100156996A1 LIQUID DISCHARGE HEAD AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2010-06-24
Information query
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