Invention Grant
- Patent Title: Gate valve and substrate-treating apparatus including the same
- Patent Title (中): 闸阀及其基片处理装置
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Application No.: US12794745Application Date: 2010-06-06
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Publication No.: US08132996B2Publication Date: 2012-03-13
- Inventor: Klaus Hügler
- Applicant: Klaus Hügler
- Applicant Address: KR Gwangju-si, Gyeonggi-do
- Assignee: Jusung Engineering Co., Ltd.
- Current Assignee: Jusung Engineering Co., Ltd.
- Current Assignee Address: KR Gwangju-si, Gyeonggi-do
- Agency: Portland IP Law LLC
- Priority: DE2005-040741 20050826; KR2006-52511 20060612
- Main IPC: H01L21/677
- IPC: H01L21/677

Abstract:
A substrate-treating apparatus includes: a plurality of modules disposed along a first direction, each of the plurality of modules having an inner space for containing a substrate; a transfer unit transferring the substrate among the plurality of modules, the transfer unit including at least one track disposed along the first direction and at least one movable transfer chamber moving along the at least one track; and a gate valve fixed to each of the plurality of modules and combined with the at least one movable transfer chamber. The at least one movable transfer chamber is isolated from an exterior atmosphere while moving.
Public/Granted literature
- US20100239395A1 GATE VALVE AND SUBSTRATE-TREATING APPARATUS INCLUDING THE SAME Public/Granted day:2010-09-23
Information query
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