Invention Grant
- Patent Title: Method of producing mold having uneven structure
- Patent Title (中): 具有不均匀结构的模具的制造方法
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Application No.: US11686512Application Date: 2007-03-15
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Publication No.: US08133538B2Publication Date: 2012-03-13
- Inventor: Ryoko Horie , Yasuhiro Matsuo , Nobuhiro Yasui , Toru Den
- Applicant: Ryoko Horie , Yasuhiro Matsuo , Nobuhiro Yasui , Toru Den
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2006-075617 20060317; JP2006-193248 20060713
- Main IPC: B05D5/00
- IPC: B05D5/00

Abstract:
A method of producing a mold having an uneven structure and a mold for an optical element are provided. The method includes forming on a nickel substrate a mixed film using nickel and a material which phase separates from nickel simultaneously, the mixed film including a plurality of cylinders including nickel as a component thereof and a matrix region including the material which phase separates from nickel as a component thereof and surrounding the plurality of cylinders; and removing the matrix portion from the mixed film by etching to give a mold including nickel or a nickel alloy. The uneven structure is disposed in plurality on the substrate, and a pitch of the uneven structure is within a range of 30 nm or more and 500 nm or less and a depth of the uneven structure is within a range of 100 nm or more.
Public/Granted literature
- US20070229942A1 METHOD OF PRODUCING MOLD HAVING UNEVEN STRUCTURE, MOLD FOR OPTICAL ELEMENT, AND OPTICAL ELEMENT Public/Granted day:2007-10-04
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