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US08133805B2 Methods for forming dense dielectric layer over porous dielectrics 有权
在多孔电介质上形成致密介电层的方法

Methods for forming dense dielectric layer over porous dielectrics
Abstract:
Methods for forming a dense dielectric layer over the surface of an opening in a porous inter-layer dielectric having an ultra-low dielectric constant are disclosed. The disclosure provides methods for exposing the sidewall surface and the bottom surface of the opening to a plurality of substantially parallel ultra-violet (UV) radiation rays to form a dense dielectric layer having a substantially uniform thickness over both the sidewall surface and the bottom surface.
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