Invention Grant
- Patent Title: Heterocyclic radical or diradical, the dimers, oligomers, polymers, dispiro compounds and polycycles thereof, the use thereof, organic semiconductive material and electronic or optoelectronic component
- Patent Title (中): 二环,二聚体,低聚物,聚合物,二恶烷化合物及其多环,其用途,有机半导体材料和电子或光电子组件
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Application No.: US11688777Application Date: 2007-03-20
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Publication No.: US08134146B2Publication Date: 2012-03-13
- Inventor: Michael Limmert , Olaf Zeika , Martin Ammann , Horst Hartmann , Ansgar Werner
- Applicant: Michael Limmert , Olaf Zeika , Martin Ammann , Horst Hartmann , Ansgar Werner
- Applicant Address: DE Dresden
- Assignee: Novaled AG
- Current Assignee: Novaled AG
- Current Assignee Address: DE Dresden
- Agency: Sutherland Asbill & Brennan LLP
- Priority: EP06005687 20060321
- Main IPC: H01L51/00
- IPC: H01L51/00 ; C07D207/00 ; C07D209/56 ; C07D221/00 ; C07D239/00 ; C07D241/00 ; C07D245/00 ; C07D307/00 ; C07D333/00

Abstract:
The present invention relates to heterocyclic radicals or diradicals, the dimers, oligomers, polymers, dispiro compounds and polycycles thereof, to the use thereof to organic semiconductive materials and to electronic and optoelectronic components.
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