Invention Grant
US08134162B2 Method for manufacturing electronic device and electronic device 有权
电子设备和电子设备的制造方法

  • Patent Title: Method for manufacturing electronic device and electronic device
  • Patent Title (中): 电子设备和电子设备的制造方法
  • Application No.: US10540384
    Application Date: 2003-12-24
  • Publication No.: US08134162B2
    Publication Date: 2012-03-13
  • Inventor: Naoki Sumi
  • Applicant: Naoki Sumi
  • Applicant Address: HK Shatin
  • Assignee: TPO Hong Kong Holding Limited
  • Current Assignee: TPO Hong Kong Holding Limited
  • Current Assignee Address: HK Shatin
  • Agency: Liu & Liu
  • Priority: JP2002-381362 20021227
  • International Application: PCT/JP03/16652 WO 20031224
  • International Announcement: WO2004/061521 WO 20040722
  • Main IPC: H01L27/15
  • IPC: H01L27/15
Method for manufacturing electronic device and electronic device
Abstract:
A method for manufacturing an electronic device comprises a step for forming a coating film (100) on a surface of a conductor portion-containing body (500), a step for forming a photosensitive film (110) on the conductor (500) on which the coating film (100) has been formed, a step for exposing the photosensitive film (110) to a pattern corresponding to a patterned recessed or protruded portion, a step for developing the exposed photosensitive film (110), and a step for baking the developed photosensitive film (110). With this method, an excessive removal of a metal film can be prevented or suppressed.
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