Invention Grant
US08134179B2 Photodiode with a reduced dark current and method for the production thereof 有权
具有降低的暗电流的光电二极管及其制造方法

Photodiode with a reduced dark current and method for the production thereof
Abstract:
A photodiode in which a pn junction is formed between the doped region (DG) formed in the surface of a crystalline semiconductor substrate and a semiconductor layer (HS) deposited above said doped region. An additional doping (GD) is provided in the edge region of the doped zone, by means of which additional doping the pn junction is shifted deeper into the substrate (SU). With the greater distance of the pn junction from defects at phase boundaries that is achieved in this way, the dark current within the photodiode is reduced.
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