Invention Grant
US08134681B2 Adjustment method, substrate processing method, substrate processing apparatus, exposure apparatus, inspection apparatus, measurement and/or inspection system, processing apparatus, computer system, program and information recording medium
有权
调整方法,基板处理方法,基板处理装置,曝光装置,检查装置,测量和/或检查系统,处理装置,计算机系统,程序和信息记录介质
- Patent Title: Adjustment method, substrate processing method, substrate processing apparatus, exposure apparatus, inspection apparatus, measurement and/or inspection system, processing apparatus, computer system, program and information recording medium
- Patent Title (中): 调整方法,基板处理方法,基板处理装置,曝光装置,检查装置,测量和/或检查系统,处理装置,计算机系统,程序和信息记录介质
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Application No.: US11706377Application Date: 2007-02-15
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Publication No.: US08134681B2Publication Date: 2012-03-13
- Inventor: Shinichi Okita
- Applicant: Shinichi Okita
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2006-041219 20060217
- Main IPC: G03B27/32
- IPC: G03B27/32 ; G03B27/52 ; G03B27/42 ; G03B27/54

Abstract:
When a host issues an analysis order that specifically instructs the analytical contents to an analytical apparatus (step 401), the analytical apparatus collects two types of measurement and/or inspection results from a measurement and/or inspection instrument (steps 403 to 409), and in step 411, the analytical apparatus analyzes the measurement and/or inspection results and optimizes processing conditions of a series of processes related to wafer W. In step 411, data related to a processing state of a processing apparatus is acquired from the processing apparatus as needed. In step 413, the measurement and/or inspection results and the optimization results are accumulated in a database, and the optimization results are transmitted to various processing apparatuses (including the measurement and/or inspection instrument). After that, the analytical apparatus sends a processing end notice to the host (step 417).
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