Invention Grant
US08134681B2 Adjustment method, substrate processing method, substrate processing apparatus, exposure apparatus, inspection apparatus, measurement and/or inspection system, processing apparatus, computer system, program and information recording medium 有权
调整方法,基板处理方法,基板处理装置,曝光装置,检查装置,测量和/或检查系统,处理装置,计算机系统,程序和信息记录介质

  • Patent Title: Adjustment method, substrate processing method, substrate processing apparatus, exposure apparatus, inspection apparatus, measurement and/or inspection system, processing apparatus, computer system, program and information recording medium
  • Patent Title (中): 调整方法,基板处理方法,基板处理装置,曝光装置,检查装置,测量和/或检查系统,处理装置,计算机系统,程序和信息记录介质
  • Application No.: US11706377
    Application Date: 2007-02-15
  • Publication No.: US08134681B2
    Publication Date: 2012-03-13
  • Inventor: Shinichi Okita
  • Applicant: Shinichi Okita
  • Applicant Address: JP Tokyo
  • Assignee: Nikon Corporation
  • Current Assignee: Nikon Corporation
  • Current Assignee Address: JP Tokyo
  • Agency: Oliff & Berridge, PLC
  • Priority: JP2006-041219 20060217
  • Main IPC: G03B27/32
  • IPC: G03B27/32 G03B27/52 G03B27/42 G03B27/54
Adjustment method, substrate processing method, substrate processing apparatus, exposure apparatus, inspection apparatus, measurement and/or inspection system, processing apparatus, computer system, program and information recording medium
Abstract:
When a host issues an analysis order that specifically instructs the analytical contents to an analytical apparatus (step 401), the analytical apparatus collects two types of measurement and/or inspection results from a measurement and/or inspection instrument (steps 403 to 409), and in step 411, the analytical apparatus analyzes the measurement and/or inspection results and optimizes processing conditions of a series of processes related to wafer W. In step 411, data related to a processing state of a processing apparatus is acquired from the processing apparatus as needed. In step 413, the measurement and/or inspection results and the optimization results are accumulated in a database, and the optimization results are transmitted to various processing apparatuses (including the measurement and/or inspection instrument). After that, the analytical apparatus sends a processing end notice to the host (step 417).
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