Invention Grant
- Patent Title: Exposure apparatus and method for producing device
- Patent Title (中): 曝光装置及其制造方法
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Application No.: US11704340Application Date: 2007-02-09
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Publication No.: US08134682B2Publication Date: 2012-03-13
- Inventor: Naoyuki Kobayashi
- Applicant: Naoyuki Kobayashi
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2003-146423 20030523; JP2003-305280 20030828; JP2004-049231 20040225
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/42
Abstract:
A lens cleaning module is provided for a lithography system having an exposure apparatus including an objective lens. The system includes a scanning stage for supporting a wafer beneath the objective lens. A cleaning module coupling with the lithography system is provided for cleaning the objective lens in a non-manual cleaning process.
Public/Granted literature
- US20070132968A1 Exposure apparatus and method for producing device Public/Granted day:2007-06-14
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