Invention Grant
- Patent Title: Method and apparatus for making fused silica
- Patent Title (中): 制造熔融石英的方法和设备
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Application No.: US11305857Application Date: 2005-12-14
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Publication No.: US08137469B2Publication Date: 2012-03-20
- Inventor: Daniel Warren Hawtof , Michael T Kelley , John Stephen Rosettie , Andrew Paul Schermerhorn , Kashyap H Shah , John Stone, III , Pushkar Tandon
- Applicant: Daniel Warren Hawtof , Michael T Kelley , John Stephen Rosettie , Andrew Paul Schermerhorn , Kashyap H Shah , John Stone, III , Pushkar Tandon
- Applicant Address: US NY Corning
- Assignee: Corning Incorporated
- Current Assignee: Corning Incorporated
- Current Assignee Address: US NY Corning
- Agent Robert P. Santandrea; Siwen Chen
- Main IPC: C03B37/018
- IPC: C03B37/018

Abstract:
Disclosed are process and apparatus for making high purity fused silica glass materials. The process involves depositing soot particles onto an essentially planar deposition supporting surface and modulation of motion of the soot-generating device relative to the deposition supporting surface to result in a low local soot density variation. The apparatus is designed to implement the planar deposition process. The invention makes it possible to produce fused silica glass without the use of potentially contaminating refractory bricks.
Public/Granted literature
- US20070130995A1 Method and apparatus for making fused silica Public/Granted day:2007-06-14
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