Invention Grant
- Patent Title: Method of manufacturing photomask
- Patent Title (中): 制造光掩模的方法
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Application No.: US12383640Application Date: 2009-03-26
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Publication No.: US08137870B2Publication Date: 2012-03-20
- Inventor: Myoung-soo Lee , Young-su Sung , Hee-bom Kim , Min-kyung Lee , Dong-gun Lee
- Applicant: Myoung-soo Lee , Young-su Sung , Hee-bom Kim , Min-kyung Lee , Dong-gun Lee
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Onello & Mello, LLP
- Priority: KR10-2005-0051118 20050614; KR10-2008-0036208 20080418
- Main IPC: G03F1/00
- IPC: G03F1/00
Abstract:
A method of manufacturing a photomask includes: providing a photomask; exposing the photomask to obtain an aerial image of the photomask and evaluating the photomask using the aerial image; and altering an optical parameter of the photomask associated with the aerial image according to the result of evaluation.
Public/Granted literature
- US20090191475A1 Method of manufacturing photomask Public/Granted day:2009-07-30
Information query
