Invention Grant
- Patent Title: Chemical precursor ampoule for vapor deposition processes
- Patent Title (中): 用于气相沉积工艺的化学前体安瓿瓶
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Application No.: US12263022Application Date: 2008-10-31
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Publication No.: US08146896B2Publication Date: 2012-04-03
- Inventor: Olkan Cuvalci , Dien-Yeh Wu , Xiaoxiong Yuan
- Applicant: Olkan Cuvalci , Dien-Yeh Wu , Xiaoxiong Yuan
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson & Sheridan, L.L.P.
- Main IPC: B01F3/04
- IPC: B01F3/04

Abstract:
An apparatus for generating a gaseous chemical precursor is provided and contains a canister having a sidewall, a top, and a bottom encompassing an interior volume therein, an inlet port and an outlet port in fluid communication with the interior volume, and an inlet tube extending into the canister and having an inlet end and an outlet end, wherein the inlet end is coupled to the inlet port. The apparatus further contains a gas dispersion plate coupled to the outlet end of the inlet tube, wherein the gas dispersion plate is at an angle within a range from about 3° to about 80°, relative to a horizontal plane which is perpendicular to a vertical axis of the canister.
Public/Granted literature
- US20100112215A1 CHEMICAL PRECURSOR AMPOULE FOR VAPOR DEPOSITION PROCESSES Public/Granted day:2010-05-06
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