Invention Grant
- Patent Title: Method of fabricating semiconductor cleaners
- Patent Title (中): 制造半导体清洁剂的方法
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Application No.: US11126424Application Date: 2005-05-11
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Publication No.: US08147615B2Publication Date: 2012-04-03
- Inventor: Frank Weber
- Applicant: Frank Weber
- Applicant Address: DE Munich
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Munich
- Agency: Slater & Matsil, L.L.P.
- Main IPC: C25F3/30
- IPC: C25F3/30

Abstract:
A method of manufacturing cleaning solvents is provided. The method includes selecting a small plurality of test solvents from a large plurality of perspective solvents. The equilibrium composition of a multi-component solution is preferably described by the Hansen solubility model. A small plurality of test solvents is applied to solute samples and the degree of dissolution or swelling recorded. Based on the degree of dissolution or swelling, at least one solvent is selected from the large plurality of perspective solvents based on the Hansen parameters. In other embodiments, the three-parameter Hansen solubility model includes additional parameters that enable more accurate solubility predictions. In one embodiment, an additional parameter accounts for oxidizing solution components. In an alternative embodiment, an additional parameter accounts for the acidic/basic property of the solution. Still another embodiment accounts for temperature effects.
Public/Granted literature
- US20060100794A1 Method of fabricating semiconductor cleaners Public/Granted day:2006-05-11
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