Invention Grant
- Patent Title: Method for the production of silicon from silyl halides
- Patent Title (中): 从甲硅烷基卤化物生产硅的方法
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Application No.: US11921035Application Date: 2006-05-23
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Publication No.: US08147656B2Publication Date: 2012-04-03
- Inventor: Norbert Auner
- Applicant: Norbert Auner
- Applicant Address: LU Luxembourg
- Assignee: Spawnt Private S.A.R.L.
- Current Assignee: Spawnt Private S.A.R.L.
- Current Assignee Address: LU Luxembourg
- Agency: Collard & Roe, P.C.
- Priority: DE102005024041 20050525
- International Application: PCT/DE2006/000891 WO 20060523
- International Announcement: WO2006/125425 WO 20061130
- Main IPC: B01J19/08
- IPC: B01J19/08 ; C01B33/02
Abstract:
The present invention relates to a method for the production of silicon from silyl halides. In a first step, the silyl halide is converted, with the generation of a plasma discharge, to a halogenated polysilane, which is subsequently decomposed to silicon, in a second step, with heating.
Public/Granted literature
- US20090127093A1 Method for the production of silicon from silyl halides Public/Granted day:2009-05-21
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