Invention Grant
US08147731B2 Alignment system and method for a substrate in a nano-imprint process
有权
纳米压印工艺中衬底的对准系统和方法
- Patent Title: Alignment system and method for a substrate in a nano-imprint process
- Patent Title (中): 纳米压印工艺中衬底的对准系统和方法
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Application No.: US12906742Application Date: 2010-10-18
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Publication No.: US08147731B2Publication Date: 2012-04-03
- Inventor: Pawan Kumar Nimmakayala , Byung-Jin Choi
- Applicant: Pawan Kumar Nimmakayala , Byung-Jin Choi
- Applicant Address: US TX Austin
- Assignee: Molecular Imprints, Inc.
- Current Assignee: Molecular Imprints, Inc.
- Current Assignee Address: US TX Austin
- Agent Cameron A. King
- Main IPC: G01B11/26
- IPC: G01B11/26
Abstract:
Methods described include placing a sensor system over a substrate positioned on a chuck. The sensor system generates a beam of optical energy towards the substrate and is configured to receive optical energy deflected from the substrate. The sensor system generates sensor signals in response to variations in received optical energy from the substrate and the chuck.
Public/Granted literature
- US20110026039A1 Alignment System and Method for a Substrate in a Nano-Imprint Process Public/Granted day:2011-02-03
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