Invention Grant
- Patent Title: Clad textured metal substrate for forming epitaxial thin film thereon and method for manufacturing the same
- Patent Title (中): 用于在其上形成外延薄膜的带纹理金属基底及其制造方法
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Application No.: US12101228Application Date: 2008-04-11
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Publication No.: US08147984B2Publication Date: 2012-04-03
- Inventor: Naoji Kashima , Shigeo Nagaya , Kunihiro Shima , Hirofumi Hoshino
- Applicant: Naoji Kashima , Shigeo Nagaya , Kunihiro Shima , Hirofumi Hoshino
- Applicant Address: JP Aichi JP Tokyo
- Assignee: Chubu Electric Power Co., Inc.,Tanaka Kikinzoku Kogyo K.K.
- Current Assignee: Chubu Electric Power Co., Inc.,Tanaka Kikinzoku Kogyo K.K.
- Current Assignee Address: JP Aichi JP Tokyo
- Agency: Roberts & Roberts, LLP
- Priority: JPP2007-108605 20070417
- Main IPC: B32B15/04
- IPC: B32B15/04 ; B32B15/18 ; B32B37/00 ; C22F1/10 ; C09J5/02

Abstract:
The present invention provides an oriented substrate for forming an epitaxial thin film thereon, which has a more excellent orientation than that of a conventional one and a high strength, and a method for manufacturing the same. A clad textured metal substrate for forming the epitaxial thin film thereon according to the present invention comprises a metallic layer and a nickel layer which is bonded to at least one face of the metallic layer, wherein the nickel layer has a {100} cube texture in which a deviating angle Δφ of crystal axes satisfies Δφ≦7 degrees and has a nickel purity of 99.9% or more. The oriented metal substrate is manufactured by cold-working the nickel sheet having a purity of 99.9% or more, heat-treating it for orientation, and bonding the metal sheet with the oriented nickel sheet by using a surface activated bonding process.
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