Invention Grant
US08147984B2 Clad textured metal substrate for forming epitaxial thin film thereon and method for manufacturing the same 有权
用于在其上形成外延薄膜的带纹理金属基底及其制造方法

Clad textured metal substrate for forming epitaxial thin film thereon and method for manufacturing the same
Abstract:
The present invention provides an oriented substrate for forming an epitaxial thin film thereon, which has a more excellent orientation than that of a conventional one and a high strength, and a method for manufacturing the same. A clad textured metal substrate for forming the epitaxial thin film thereon according to the present invention comprises a metallic layer and a nickel layer which is bonded to at least one face of the metallic layer, wherein the nickel layer has a {100} cube texture in which a deviating angle Δφ of crystal axes satisfies Δφ≦7 degrees and has a nickel purity of 99.9% or more. The oriented metal substrate is manufactured by cold-working the nickel sheet having a purity of 99.9% or more, heat-treating it for orientation, and bonding the metal sheet with the oriented nickel sheet by using a surface activated bonding process.
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