Invention Grant
- Patent Title: Optical component for EUVL and smoothing method thereof
- Patent Title (中): EUVL的光学元件及其平滑方法
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Application No.: US12858577Application Date: 2010-08-18
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Publication No.: US08148037B2Publication Date: 2012-04-03
- Inventor: Motoshi Ono , Mitsuru Watanabe , Masabumi Ito
- Applicant: Motoshi Ono , Mitsuru Watanabe , Masabumi Ito
- Applicant Address: JP Tokyo
- Assignee: Asahi Glass Company, Limited
- Current Assignee: Asahi Glass Company, Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2008-037531 20080219; JP2008-299647 20081125
- Main IPC: G03F1/00
- IPC: G03F1/00 ; B23K26/00
Abstract:
The present invention is to provide a method for smoothing the optical surface having a concave defect of an optical component for EUVL.The present invention relates to a method for smoothing the optical surface of an optical component for EUVL, comprising irradiating, with an excimer laser having a wavelength of 250 nm or less with a fluence of 0.5 to 2.0 J/cm2, the optical surface having a concave defect of an optical component for EUV lithography (EUVL), the optical component being made of a TiO2-containing silica glass material comprising SiO2 as a main component.
Public/Granted literature
- US20100315704A1 OPTICAL COMPONENT FOR EUVL AND SMOOTING METHOD THEREOF Public/Granted day:2010-12-16
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