Invention Grant
- Patent Title: Method for manufacturing substrate for making microarray
- Patent Title (中): 制造微阵列基板的方法
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Application No.: US12073953Application Date: 2008-03-12
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Publication No.: US08148053B2Publication Date: 2012-04-03
- Inventor: Wataru Kusaki , Takeshi Kinsho , Toshinobu Ishihara
- Applicant: Wataru Kusaki , Takeshi Kinsho , Toshinobu Ishihara
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, Plc
- Priority: JP2007-75309 20070322
- Main IPC: G03F7/26
- IPC: G03F7/26

Abstract:
To provide a method for manufacturing a substrate for making a microarray which will ensure the secure immobilization of a material in a site-selective manner at a low cost. The method comprises the steps of: forming a monomolecular film on the surface of a substrate using a silane compound represented by the following general formula (1), Y3Si—(CH2)m—X (1), wherein m represents an integer from 3 to 20; X represents a hydroxyl group precursor functional group which will be converted to a hydroxyl group when exposed to acid; and Y independently represents a halogen atom or alkoxy group having 1-4 carbon atoms; and converting the hydroxyl group precursor functional group represented by X to a hydroxyl group; wherein the step of converting a hydroxyl group precursor functional group represented by X to a hydroxyl group comprises forming, on the monomolecular film, a polymer layer containing a compound represented by the following general formula (2) or (3),
Public/Granted literature
- US20080233309A1 Method for manufacturing substrate for making microarray Public/Granted day:2008-09-25
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