Invention Grant
- Patent Title: Method for manufacturing semiconductor light emitting device
- Patent Title (中): 半导体发光元件的制造方法
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Application No.: US12797711Application Date: 2010-06-10
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Publication No.: US08148183B2Publication Date: 2012-04-03
- Inventor: Hiroshi Hamasaki , Akihiro Kojima , Yoshiaki Sugizaki
- Applicant: Hiroshi Hamasaki , Akihiro Kojima , Yoshiaki Sugizaki
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Turocy & Watson, LLP
- Priority: JP2009-180402 20090803
- Main IPC: H01L21/56
- IPC: H01L21/56

Abstract:
According to one embodiment, a method for manufacturing a semiconductor light emitting device includes forming a separation groove on a major surface of a substrate. A semiconductor layer including a light emitting layer is formed on the substrate. The separation groove separates the semiconductor layer into a plurality of elements. The method includes forming an insulating film on the major surface of the substrate. The insulating film covers the semiconductor layer and a bottom surface of the separation groove provided on the substrate. The method includes separating the substrate from the semiconductor layer by irradiating the semiconductor layer with laser light from an surface of the substrate opposite to the major surface. An edge portion of irradiation area of the laser light is positioned near an edge portion of the semiconductor layer neighboring the separation groove.
Public/Granted literature
- US20110027921A1 METHOD FOR MANUFACTURING SEMICONDUCTOR LIGHT EMITTING DEVICE Public/Granted day:2011-02-03
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