Invention Grant
- Patent Title: Semiconductor device and method of fabricating the same
- Patent Title (中): 半导体装置及其制造方法
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Application No.: US13236941Application Date: 2011-09-20
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Publication No.: US08148193B2Publication Date: 2012-04-03
- Inventor: Jae-Hyun Park , Jae-Hee Oh
- Applicant: Jae-Hyun Park , Jae-Hee Oh
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Myers Bigel Sibley & Sajovec, P.A.
- Priority: KR2006-95915 20060929
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A semiconductor device such as a phase change memory device includes a semiconductor substrate including an active region, a conductive pattern disposed to expose the active region, an interlayer dielectric pattern provided on the conductive pattern and including an opening formed on the exposed active region and a contact hole spaced apart from the opening to expose the conductive pattern, a semiconductor pattern and a heater electrode pattern electrically connected to the exposed active region and provided in the opening, a contact plug connected to the exposed conductive pattern and provided to fill the contact hole, and a phase change material layer provided on the heater electrode pattern.
Public/Granted literature
- US20120009755A1 Semiconductor Device and Method of Fabricating the Same Public/Granted day:2012-01-12
Information query
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