Invention Grant
US08148233B2 Semiconductor power device having a top-side drain using a sinker trench
有权
半导体功率器件具有使用沉陷沟槽的顶侧漏极
- Patent Title: Semiconductor power device having a top-side drain using a sinker trench
- Patent Title (中): 半导体功率器件具有使用沉陷沟槽的顶侧漏极
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Application No.: US13178391Application Date: 2011-07-07
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Publication No.: US08148233B2Publication Date: 2012-04-03
- Inventor: Thomas E. Grebs , Gary M. Dolny
- Applicant: Thomas E. Grebs , Gary M. Dolny
- Applicant Address: US ME South Portland
- Assignee: Fairchild Semiconductor Corporation
- Current Assignee: Fairchild Semiconductor Corporation
- Current Assignee Address: US ME South Portland
- Agency: Kilpatrick Townsend & Stockton LLP
- Main IPC: H01L31/113
- IPC: H01L31/113

Abstract:
A semiconductor power device includes a plurality of groups of stripe-shaped gate trenches extending in a silicon region over a substrate, and a plurality of stripe-shaped sinker trenches each extending between two adjacent groups of the plurality of groups of stripe-shaped gate trenches. The plurality of stripe-shaped sinker trenches extend from a top surface of the silicon region through the silicon region and terminate within the substrate. The plurality of stripe-shaped sinker trenches are lined with an insulator along the sinker trench sidewalls so that a conductive material filling each sinker trench makes electrical contact with the substrate along the bottom of the sinker trench and makes electrical contact with an interconnect layer along the top of the sinker trench.
Public/Granted literature
- US20110260241A1 Semiconductor Power Device Having a Top-side Drain Using a Sinker Trench Public/Granted day:2011-10-27
Information query
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