Invention Grant
- Patent Title: Offset field grid for efficient wafer layout
- Patent Title (中): 用于高效晶片布局的偏移现场网格
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Application No.: US12646459Application Date: 2009-12-23
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Publication No.: US08148239B2Publication Date: 2012-04-03
- Inventor: Alejandro Varela , Troy L. Harling , Daniel E. Vanlare
- Applicant: Alejandro Varela , Troy L. Harling , Daniel E. Vanlare
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Winkle, PLLC
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L23/58

Abstract:
Techniques are provided for efficient wafer layout, which include the use of an offset grid to optimize use of available wafer space. As such, the number of identical die that can be fabricated on the wafer can be increased, relative to a standard perpendicular grid. By adding additional registration marks, an increase in flexibility of where each row/column of fields can be printed is enabled. This increased level of freedom in-turn allows for the optimization of the number of die that each row/column can contain, and translates directly into an increase in the number of yielding die per wafer. In addition, techniques are provided that allow for the dicing of individual die in a non-Cartesian coordinated manner. However, conventional singulation techniques can be used as well, given attention to the offset grid lines.
Public/Granted literature
- US20110147897A1 OFFSET FIELD GRID FOR EFFICIENT WAFER LAYOUT Public/Granted day:2011-06-23
Information query
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