Invention Grant
- Patent Title: Methods for fabrication of high aspect ratio micropillars and nanopillars
- Patent Title (中): 高比例微柱和纳米柱的制造方法
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Application No.: US12711992Application Date: 2010-02-24
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Publication No.: US08148264B2Publication Date: 2012-04-03
- Inventor: Michael D. Henry , Andrew P. Homyk , Axel Scherer , Sameer Walavalkar
- Applicant: Michael D. Henry , Andrew P. Homyk , Axel Scherer , Sameer Walavalkar
- Applicant Address: US CA Pasadena
- Assignee: California Institue of Technology
- Current Assignee: California Institue of Technology
- Current Assignee Address: US CA Pasadena
- Agency: Steinfl & Bruno, LLP
- Main IPC: H01L21/44
- IPC: H01L21/44 ; H01L29/40
Abstract:
Methods for fabrication of high aspect ratio micropillars and nanopillars are described. Use of alumina as an etch mask for the fabrication methods is also described. The resulting micropillars and nanopillars are analyzed and a characterization of the etch mask is provided.
Public/Granted literature
- US20100213579A1 METHODS FOR FABRICATION OF HIGH ASPECT RATIO MICROPILLARS AND NANOPILLARS Public/Granted day:2010-08-26
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