Invention Grant
- Patent Title: Superconducting film and method of manufacturing the same
- Patent Title (中): 超导薄膜及其制造方法
-
Application No.: US12662741Application Date: 2010-04-30
-
Publication No.: US08148300B2Publication Date: 2012-04-03
- Inventor: Kaname Matsumoto , Masashi Mukaida , Yutaka Yoshida , Ataru Ichinose , Shigeru Horii
- Applicant: Kaname Matsumoto , Masashi Mukaida , Yutaka Yoshida , Ataru Ichinose , Shigeru Horii
- Applicant Address: JP Saitama JP Tokyo
- Assignee: Japan Science and Technology Agency,Central Research Institute of Electric Power Industry
- Current Assignee: Japan Science and Technology Agency,Central Research Institute of Electric Power Industry
- Current Assignee Address: JP Saitama JP Tokyo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- Priority: JP2003-308020 20030829
- Main IPC: H01L39/24
- IPC: H01L39/24
Abstract:
The present invention relates to a superconducting film having a substrate and a superconductor layer formed on the substrate, in which nano grooves are formed parallel to a current flowing direction on a substrate surface on which the superconductor layer is formed and two-dimensional crystal defects are introduced in the superconductor layer on the nano grooves, and a method of manufacturing this superconducting film. A superconducting film of the invention, which is obtained at low cost and has very high Jc, is useful in applications such as cables, magnets, shields, current limiters, microwave devices, and semifinished products of these articles.
Public/Granted literature
- US20100267568A1 Superconducting film and method of manufacturing the same Public/Granted day:2010-10-21
Information query
IPC分类:
