Invention Grant
- Patent Title: Wiring substrate and method of manufacturing the same
- Patent Title (中): 接线基板及其制造方法
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Application No.: US12189852Application Date: 2008-08-12
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Publication No.: US08148645B2Publication Date: 2012-04-03
- Inventor: Kazuhiro Yoshikawa
- Applicant: Kazuhiro Yoshikawa
- Applicant Address: JP Ogaki-shi
- Assignee: Ibiden Co., Ltd.
- Current Assignee: Ibiden Co., Ltd.
- Current Assignee Address: JP Ogaki-shi
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Main IPC: H05K1/16
- IPC: H05K1/16 ; H05K7/06

Abstract:
A wiring substrate and method of forming a wiring substrate. The wiring substrate includes a base substrate, a first resin insulating layer provided on the base substrate and a laminated capacitor formed within the first resin insulating layer. The laminated capacitor includes a plurality of capacitors laminated to each other by adhesive, each capacitor including a first electrode, a second electrode opposing the first electrode and a dielectric layer interposed between the first and second electrodes. A first via conductor electrically connects the first electrodes of the plurality of capacitors to each other, and a second via conductor electrically connects the second electrodes of the plurality of capacitors to each other. A first external terminal electrically connects to the first via conductor, and a second external terminal electrically connects to the second via conductor.
Public/Granted literature
- US20090266594A1 WIRING SUBSTRATE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2009-10-29
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