Invention Grant
- Patent Title: Apparatus and method for soft baking photoresist on substrate
- Patent Title (中): 在基材上软化光刻胶的装置和方法
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Application No.: US11167195Application Date: 2005-06-28
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Publication No.: US08148665B2Publication Date: 2012-04-03
- Inventor: Chae-Rock Lim
- Applicant: Chae-Rock Lim
- Applicant Address: KR Seoul
- Assignee: LG Display Co., Ltd.
- Current Assignee: LG Display Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: KR10-2004-0069339 20040831
- Main IPC: F27B5/06
- IPC: F27B5/06 ; F27D5/00 ; H01L21/00 ; H01L21/683 ; H01L21/68
Abstract:
An apparatus for soft baking a substrate having a dummy region is provided. The apparatus includes a heating plate, a plurality of pins, and a driving unit for individually lifting selective ones of the plurality of pins so as to protrude from an upper surface of the heating plate.
Public/Granted literature
- US20060054791A1 Apparatus and method for soft baking photoresist on substrate Public/Granted day:2006-03-16
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