Invention Grant
- Patent Title: Charged particle beam writing apparatus
- Patent Title (中): 带电粒子束写入装置
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Application No.: US12714735Application Date: 2010-03-01
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Publication No.: US08148698B2Publication Date: 2012-04-03
- Inventor: Tetsurou Nishiyama
- Applicant: Tetsurou Nishiyama
- Applicant Address: JP Numazu-shi
- Assignee: NuFlare Technology, Inc.
- Current Assignee: NuFlare Technology, Inc.
- Current Assignee Address: JP Numazu-shi
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2009-069566 20090323
- Main IPC: H01J37/147
- IPC: H01J37/147

Abstract:
A blanking deflector 23 is of the coaxial type and includes a rod-like inner electrode 231 and a cylindrical outer electrode 232 enclosing the inner electrode 231 such that an air gap through which the charged particle beam B passes is formed between the inner and outer electrodes 231 and 232. The inner electrode 231 and the outer electrode 232 are formed by forming electrode films 231b and 232b of a metal over the surfaces of nonconducting base materials 231a and 232a, respectively, by vacuum deposition or sputtering. Further, each of the shaping deflector and the main deflector and sub-deflector for beam scanning includes a plurality of pairs of opposite electrodes, and each opposite electrode is formed by forming an electrode film of a metal over the surface of a nonconducting base material by vacuum deposition or sputtering.
Public/Granted literature
- US20100237261A1 CHARGED PARTICLE BEAM WRITING APPARATUS Public/Granted day:2010-09-23
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