Invention Grant
US08148727B2 Display device having oxide thin film transistor and fabrication method thereof
有权
具有氧化物薄膜晶体管的显示装置及其制造方法
- Patent Title: Display device having oxide thin film transistor and fabrication method thereof
- Patent Title (中): 具有氧化物薄膜晶体管的显示装置及其制造方法
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Application No.: US13166478Application Date: 2011-06-22
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Publication No.: US08148727B2Publication Date: 2012-04-03
- Inventor: Im-Kuk Kang , Dae-Won Kim
- Applicant: Im-Kuk Kang , Dae-Won Kim
- Applicant Address: KR Seoul
- Assignee: LG Display Co., Ltd.
- Current Assignee: LG Display Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: Brinks Hofer Gilson & Lione
- Priority: KR10-2009-0048778 20090602
- Main IPC: H01L29/04
- IPC: H01L29/04 ; H01L31/036 ; H01L31/0376 ; H01L31/20

Abstract:
A display device including an oxide thin film transistor (TFT) is disclosed. A nitride-based gate insulating layer of a gate pad area is etched when an oxide semiconductor layer of a pixel area is etched by using a half-tone mask, a metal layer is formed at a contact hole of the etched gate insulting layer, and then a passivation layer formed thereon is etched. Thus, an overhang of the passivation layer can be prevented from being generated when the gate insulating layer is etched, and accordingly, the fabrication process can be simplified.
Public/Granted literature
- US20110248262A1 DISPLAY DEVICE HAVING OXIDE THIN FILM TRANSISTOR AND FABRICATION METHOD THEREOF Public/Granted day:2011-10-13
Information query
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