Invention Grant
- Patent Title: Solid-state imaging device and manufacturing method thereof
- Patent Title (中): 固态成像装置及其制造方法
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Application No.: US12691919Application Date: 2010-01-22
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Publication No.: US08148755B2Publication Date: 2012-04-03
- Inventor: Ikuo Mizuno , Mitsuyoshi Andou , Noriaki Suzuki
- Applicant: Ikuo Mizuno , Mitsuyoshi Andou , Noriaki Suzuki
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: Greenblum & Bernstein, P.L.C.
- Priority: JP2009-021007 20090130
- Main IPC: H01L27/148
- IPC: H01L27/148

Abstract:
A solid-state imaging device including: light-receiving units which are formed in rows and columns; a transfer channel formed in each column; first and second transfer electrodes that are formed in the same layer and deposited alternately above the transfer channel; insulating regions each formed above the transfer channel and between one of the first transfer electrodes and one of the second transfer electrodes which are adjacent to each other; an antireflection film formed above the light-receiving units, and formed on the insulating regions to cover the insulating regions; a first wire formed in each row in a layer upper than the antireflection film, and electrically connected to second transfer electrodes; and a light-shielding film which is formed in a layer upper than the first wire, covers the transfer channel, and has an opening above each of the light-receiving units.
Public/Granted literature
- US20100193844A1 SOLID-STATE IMAGING DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2010-08-05
Information query
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