Invention Grant
- Patent Title: Stress programming of transistors
- Patent Title (中): 晶体管的应力编程
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Application No.: US12953117Application Date: 2010-11-23
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Publication No.: US08149011B1Publication Date: 2012-04-03
- Inventor: Lakhbeer S. Sidhu , Choy Hing Li
- Applicant: Lakhbeer S. Sidhu , Choy Hing Li
- Applicant Address: BM Hamilton
- Assignee: Marvell International Ltd.
- Current Assignee: Marvell International Ltd.
- Current Assignee Address: BM Hamilton
- Main IPC: G01R31/02
- IPC: G01R31/02

Abstract:
A method comprising applying a first voltage to a first transistor to create a defect in the first transistor, wherein (i) the first voltage is greater than a maximum operational voltage of the first transistor and (ii) the maximum operational voltage does not cause a defect in the first transistor when applied to the first transistor. The method further includes determining whether the first transistor has been programmed, including (i) measuring a first current through the first transistor, (ii) measuring a second current through a second transistor, and (iii) comparing the measured first current to the measured second current, wherein a difference between the measured first current and the measured second current indicates that the first transistor has been programmed.
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