Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method
- Patent Title (中): 平版印刷设备和器件制造方法
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Application No.: US12292961Application Date: 2008-12-01
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Publication No.: US08149379B2Publication Date: 2012-04-03
- Inventor: Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Lucas Henricus Johannes Stevens , Ronald Van Der Ham , Michel Riepen
- Applicant: Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Lucas Henricus Johannes Stevens , Ronald Van Der Ham , Michel Riepen
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/32
Abstract:
The use of electro wetting to control the behavior of immersion liquid within an immersion lithographic apparatus is disclosed.
Public/Granted literature
- US20090161083A1 Lithographic apparatus and device manufacturing method Public/Granted day:2009-06-25
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