Invention Grant
- Patent Title: Apparatus and method for inspecting pattern
- Patent Title (中): 用于检查图案的装置和方法
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Application No.: US13069091Application Date: 2011-03-22
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Publication No.: US08149395B2Publication Date: 2012-04-03
- Inventor: Sachio Uto , Minoru Yoshida , Toshihiko Nakata , Shunzi Maeda , Atsushi Shimoda
- Applicant: Sachio Uto , Minoru Yoshida , Toshihiko Nakata , Shunzi Maeda , Atsushi Shimoda
- Applicant Address: JP Tokyo
- Assignee: Hitachi, Ltd.
- Current Assignee: Hitachi, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP2001-228166 20010727
- Main IPC: G01N21/00
- IPC: G01N21/00

Abstract:
A method and apparatus for inspecting defects includes emitting an ultraviolet light from an ultraviolet light source, illuminating a specimen with the ultraviolet light in which a polarization condition of the ultraviolet light is controlled, controlling a polarization condition of light reflected from the specimen which is illuminated by the polarization condition controlled ultraviolet light, detecting the light reflected from the specimen, processing the detected light so as to detect defects, and outputting information about the defects. The ultraviolet light source is disposed in a clean environment supplied with clean gas and separated from outside.
Public/Granted literature
- US20110170092A1 APPARATUS AND METHOD FOR INSPECTING PATTERN Public/Granted day:2011-07-14
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