Invention Grant
US08149562B2 System for decharging a wafer or substrate after dechucking from an electrostatic chuck
有权
用于在从静电卡盘脱扣后对晶片或基板进行放电的系统
- Patent Title: System for decharging a wafer or substrate after dechucking from an electrostatic chuck
- Patent Title (中): 用于在从静电卡盘脱扣后对晶片或基板进行放电的系统
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Application No.: US11684280Application Date: 2007-03-09
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Publication No.: US08149562B2Publication Date: 2012-04-03
- Inventor: Yen-Hsiang Hsu , Jeng-Yann Tsay
- Applicant: Yen-Hsiang Hsu , Jeng-Yann Tsay
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Duane Morris LLP
- Main IPC: H01L21/683
- IPC: H01L21/683

Abstract:
A system for decharging a wafer or substrate disposed on an electrostatic chuck, includes a capacitance detector for measuring a capacitance between the electrostatic chuck and the wafer or substrate, and a decharging voltage calculator for calculating a decharging voltage based at least in part on the capacitance measured by the capacitance detector. The decharging voltage calculated by the decharging voltage calculator of the system is applied to the electrostatic chuck after dechucking to substantially neutralize electrostatic charges on the wafer or substrate.
Public/Granted literature
- US20080218931A1 SYSTEM FOR DECHARGING A WAFER OR SUBSTRATE AFTER DECHUCKING FROM AN ELECTROSTATIC CHUCK Public/Granted day:2008-09-11
Information query
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