Invention Grant
- Patent Title: Gas treatment systems
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Application No.: US12008705Application Date: 2008-01-11
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Publication No.: US08152923B2Publication Date: 2012-04-10
- Inventor: Bojan Mitrovic , Alex Gurary , Eric A. Armour
- Applicant: Bojan Mitrovic , Alex Gurary , Eric A. Armour
- Applicant Address: US NY Plainview
- Assignee: Veeco Instruments Inc.
- Current Assignee: Veeco Instruments Inc.
- Current Assignee Address: US NY Plainview
- Agency: Lerner, David, Littenberg, Krumholz & Mentlik, LLP
- Main IPC: C23C16/00
- IPC: C23C16/00 ; C23C16/455 ; H01L21/306

Abstract:
An MOCVD reactor such as a rotating disc reactor (10) is equipped with a gas injector head having diffusers (129) disposed between adjacent gas inlets. The diffusers taper in the downstream direction. The injector head desirably has inlets (117) for a first gas such as a metal alkyl disposed in radial rows which terminate radially inward from the reactor wall to minimize deposition of the reactants on the reactor wall. The injector head desirably also has inlets (125) for a second gas such as ammonia arranged in a field between the rows of first gas inlets, and additionally has a center inlet (135) for the second gas coaxial with the axis of rotation.
Public/Granted literature
- US20080173735A1 Gas treatment systems Public/Granted day:2008-07-24
Information query
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