Invention Grant
US08152928B2 Substrate cleaning method, substrate cleaning system and program storage medium
有权
基板清洗方法，基板清洗系统和程序存储介质
- Patent Title: Substrate cleaning method, substrate cleaning system and program storage medium
- Patent Title (中): 基板清洗方法，基板清洗系统和程序存储介质
-
Application No.: US11798599Application Date: 2007-05-15
-
Publication No.: US08152928B2Publication Date: 2012-04-10
- Inventor: Tsukasa Watanabe , Naoki Shindo , Koukichi Hiroshiro , Yuji Kamikawa
- Applicant: Tsukasa Watanabe , Naoki Shindo , Koukichi Hiroshiro , Yuji Kamikawa
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Smith, Gambrell & Russell, LLP
- Priority: JP2006-140377 20060519
- Main IPC: B08B6/00
- IPC: B08B6/00 ; B08B7/00 ; B08B7/02 ; B08B3/12 ; H01L21/304
Abstract:
A substrate cleaning method can uniformly removing particles from substrates at a high removing efficiency. The substrate cleaning method includes the steps of immersing substrates W in a cleaning liquid in a cleaning tank 12, and generating ultrasonic waves in the cleaning liquid contained in the cleaning tank. A region in the cleaning tank toward which the cleaning liquid is supplied is varied with respect to a vertical level in the step of generating ultrasonic waves in the cleaning liquid while the cleaning liquid is being supplied into the cleaning tank.
Public/Granted literature
- US20070267040A1 Substrate cleaning method, substrate cleaning system and program storage medium Public/Granted day:2007-11-22
Information query
IPC分类:
