Invention Grant
- Patent Title: Method for producing highly pure solutions using gaseous hydrogen fluoride
- Patent Title (中): 使用氟化氢气体生产高纯度溶液的方法
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Application No.: US10455067Application Date: 2003-06-05
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Publication No.: US08153095B2Publication Date: 2012-04-10
- Inventor: Michael A. Dodd , John McFarland , Wolfgang Sievert
- Applicant: Michael A. Dodd , John McFarland , Wolfgang Sievert
- Applicant Address: US NJ Morritown
- Assignee: Honeywell International Inc.
- Current Assignee: Honeywell International Inc.
- Current Assignee Address: US NJ Morritown
- Main IPC: C01B7/19
- IPC: C01B7/19

Abstract:
Methods for producing highly pure solutions containing hydrogen fluoride, one or more salts thereof or a mixture of two or more thereof, by adding hydrogen fluoride to at least one anhydrous solvent, wherein the hydrogen fluoride is added to the anhydrous solvent or solvents in the form of a gas or as a liquified gas or as a mixture of gas and liquefied gas. High purity hydrogen fluoride and ammonium fluoride solutions produced by the inventive method are also disclosed.
Public/Granted literature
- US20040075078A1 Method for producing highly pure solutions using gaseous hydrogen fluoride Public/Granted day:2004-04-22
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