Invention Grant
- Patent Title: Method and apparatus for manufacturing magnetoresistive element
- Patent Title (中): 用于制造磁阻元件的方法和装置
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Application No.: US12248578Application Date: 2008-10-09
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Publication No.: US08153188B2Publication Date: 2012-04-10
- Inventor: Hideaki Fukuzawa , Katsuhiko Koui , Hiromi Yuasa , Susumu Hashimoto , Hitoshi Iwasaki
- Applicant: Hideaki Fukuzawa , Katsuhiko Koui , Hiromi Yuasa , Susumu Hashimoto , Hitoshi Iwasaki
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2004-233641 20040810
- Main IPC: G11B5/127
- IPC: G11B5/127 ; G11B5/00 ; G11B5/62 ; H05H1/00

Abstract:
The present invention relates to a method for manufacturing a magnetoresistive element having a magnetization pinned layer, a magnetization free layer, and a spacer layer including an insulating layer provided between the magnetization pinned layer and the magnetization free layer and current paths penetrating into the insulating layer. A process of forming the spacer layer in the method includes depositing a first metal layer forming the metal paths, depositing a second metal layer on the first metal layer, performing a pretreatment of irradiating the second metal layer with an ion beam or a RF plasma of a rare gas, and converting the second metal layer into the insulating layer by means of supplying an oxidation gas or a nitriding gas.
Public/Granted literature
- US20090061105A1 METHOD AND APPARATUS FOR MANUFACTURING MAGNETORESISTIVE ELEMENT Public/Granted day:2009-03-05
Information query
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