Invention Grant
- Patent Title: Patterned magnetic recording medium and method of manufacturing the same
- Patent Title (中): 图案化磁记录介质及其制造方法
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Application No.: US12275703Application Date: 2008-11-21
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Publication No.: US08153190B2Publication Date: 2012-04-10
- Inventor: Yun-woo Nam
- Applicant: Yun-woo Nam
- Applicant Address: KR Suwon-Si, Gyeonggi-Do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-Si, Gyeonggi-Do
- Agency: Buchanan Ingersoll & Rooney PC
- Priority: KR10-2003-0049550 20030719
- Main IPC: G11B5/33
- IPC: G11B5/33 ; G11B5/00 ; B44C1/22

Abstract:
Provided are a patterned magnetic recording medium which has an extremely planarized surface and a method of manufacturing the same. The medium includes a patterned magnetic layer including a plurality of magnetic columns that are arranged with a predetermined pitch therebetween; a substrate that supports the patterned magnetic layer; and a boundary layer, which is filled in gaps between the magnetic columns of the patterned magnetic layer. Thus, an air bearing due to stable airflow is created over the magnetic layer, and magnetic recording/reproduction are easily achieved at ultrahigh density.
Public/Granted literature
- US20090071935A1 PATTERNED MAGNETIC RECORDING MEDIUM AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2009-03-19
Information query
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