Invention Grant
- Patent Title: Photosensitive composition, partition walls and black matrix
- Patent Title (中): 光敏组合物，隔墙和黑色矩阵
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Application No.: US12627099Application Date: 2009-11-30
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Publication No.: US08153340B2Publication Date: 2012-04-10
- Inventor: Hideyuki Takahashi , Kenji Ishizeki
- Applicant: Hideyuki Takahashi , Kenji Ishizeki
- Applicant Address: JP Tokyo
- Assignee: Asahi Glass Company, Limited
- Current Assignee: Asahi Glass Company, Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2007-142104 20070529
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G02B5/20
Abstract:
To provide a photosensitive composition with which it is possible to form partition walls (black matrix) having excellent light shielding properties and liquid repellency.A photosensitive composition, which comprises a polymer (A) having a side chain containing a fluorine atom-containing group or a silicon atom-containing group and a side chain containing an ethylenic double bond in one molecule, a black colorant (B), a photopolymerization initiator (C) which is an O-acyloxime compound, and a photosensitive resin (D) containing an acidic group and an ethylenic double bond in one molecule, wherein the proportion of the black colorant (B) in the total solid content of the composition is from 15 to 60 mass %.
Public/Granted literature
- US20100072889A1 PHOTOSENSITIVE COMPOSITION, PARTITION WALLS AND BLACK MATRIX Public/Granted day:2010-03-25
Information query
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