Polymer composition, hardmask composition having antireflective properties, and associated methods

Invention Grant

US08153349B2 Polymer composition, hardmask composition having antireflective properties, and associated methods 有权

Title translation: 聚合物组合物，具有抗反射性能的硬掩模组合物和相关方法

Patent Title: Polymer composition, hardmask composition having antireflective properties, and associated methods
Patent Title (中): 聚合物组合物，具有抗反射性能的硬掩模组合物和相关方法
Application No.: US12318255

Application Date: 2008-12-23
Publication No.: US08153349B2

Publication Date: 2012-04-10
Inventor: Hwan Sung Cheon , Jong Seob Kim , Kyong Ho Yoon , Min Soo Kim , Jin Kuk Lee , Jee Yun Song
Applicant: Hwan Sung Cheon , Jong Seob Kim , Kyong Ho Yoon , Min Soo Kim , Jin Kuk Lee , Jee Yun Song
Applicant Address: KR Gumi-si, Kyeongsangbuk-do
Assignee: Cheil Industries, Inc.
Current Assignee: Cheil Industries, Inc.
Current Assignee Address: KR Gumi-si, Kyeongsangbuk-do
Agency: Lee & Morse, P.C.
Priority: KR10-2007-0136059 20071224
Main IPC: G03F7/20
IPC: G03F7/20 ; G03F7/30 ; G03F7/36 ; G03C1/825 ; C08G61/00

Abstract:

A polymer composition includes an aromatic ring-containing polymer represented by Formula 1: wherein m and n satisfy the relations 1≦m

Abstract(Chinese):

聚合物组合物包括由式1表示的含芳环的聚合物：其中m和n满足关系1＆nlE; m <190,0和nlE; n <190,1和nlE; m + n <190。

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IPC分类:

G	物理
G03	摄影术；电影术；利用了光波以外其他波的类似技术；电记录术；全息摄影术
G03F	图纹面的照相制版工艺，例如，印刷工艺、半导体器件的加工工艺；其所用材料；其所用原版；其所用专用设备（照相排版装置入B41B；为摄影用的感光材料或处理入G03C；电记录、感光层或处理入G03G）
G03F7/00	图纹面，例如，印刷表面的照相制版如光刻工艺；图纹面照相制版用的材料，如：含光致抗蚀剂的材料；图纹面照相制版的专用设备（用于特殊工艺的光致抗蚀剂结构见相关的位置，例如，B44C，H01L，例如，H01L21/00，H05K）
G03F7/20	.曝光及其设备（复制用照相印制设备入G03B27/00）