Invention Grant
- Patent Title: Immersion supporting plate cleaning method and a pattern forming method
- Patent Title (中): 浸渍支撑板清洗方法和图案形成方法
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Application No.: US11898322Application Date: 2007-09-11
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Publication No.: US08153355B2Publication Date: 2012-04-10
- Inventor: Shinichi Ito
- Applicant: Shinichi Ito
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- Priority: JP2006-248377 20060913
- Main IPC: G03F7/26
- IPC: G03F7/26
Abstract:
An immersion supporting plate cleaning method of cleaning an immersion supporting plate provided around a substrate to be processed in immersion exposure. An immersion boundary between an immersion area contact part and an immersion area noncontact part on the immersion supporting plate formed when an immersion area is moved according to a predetermined exposure area and an exposure map is determined in advance. Then, the immersion supporting plate is cleaned while a cleaning jig is being moved along the determined immersion boundary.
Public/Granted literature
- US20080063987A1 Immersion supporting plate cleaning method and a pattern forming method Public/Granted day:2008-03-13
Information query
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