Invention Grant
US08153507B2 Method of manufacturing high power array type semiconductor laser device
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制造大功率阵列型半导体激光器件的方法
- Patent Title: Method of manufacturing high power array type semiconductor laser device
- Patent Title (中): 制造大功率阵列型半导体激光器件的方法
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Application No.: US11677677Application Date: 2007-02-22
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Publication No.: US08153507B2Publication Date: 2012-04-10
- Inventor: Byung Jin Ma
- Applicant: Byung Jin Ma
- Applicant Address: KR Gyunggi-do
- Assignee: Samsung LED Co., Ltd.
- Current Assignee: Samsung LED Co., Ltd.
- Current Assignee Address: KR Gyunggi-do
- Agency: McDermott Will & Emery LLP
- Priority: KR10-2006-0017420 20060222
- Main IPC: H01L21/30
- IPC: H01L21/30

Abstract:
A method of manufacturing an array type semiconductor laser device. The method includes forming first and second electrodes on lower and upper surfaces of a wafer comprising a plurality of semiconductor laser arrays having a plurality of laser emission regions, and forming a metal bonding layer on the second electrode of the wafer. The method also includes dicing the wafer into the semiconductor laser arrays and mounting each of the individually separated semiconductor laser arrays on a base with the surface of the metal bonding layer in contact with the base. The method further includes melting the metal bonding layer to fix the mounted semiconductor laser array on the base.
Public/Granted literature
- US20070196951A1 METHOD OF MANUFACTURING HIGH POWER ARRAY TYPE SEMICONDUCTOR LASER DEVICE Public/Granted day:2007-08-23
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