Invention Grant
US08153836B2 Silsesquioxane compound mixture, hydrolyzable silane compound, making methods, resist composition, patterning process, and substrate processing
有权
倍半硅氧烷复合混合物，可水解硅烷化合物，制备方法，抗蚀剂组合物，图案化工艺和基材加工
- Patent Title: Silsesquioxane compound mixture, hydrolyzable silane compound, making methods, resist composition, patterning process, and substrate processing
- Patent Title (中): 倍半硅氧烷复合混合物，可水解硅烷化合物，制备方法，抗蚀剂组合物，图案化工艺和基材加工
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Application No.: US11860872Application Date: 2007-09-25
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Publication No.: US08153836B2Publication Date: 2012-04-10
- Inventor: Mutsuo Nakashima , Yoshitaka Hamada , Katsuya Takemura , Kazumi Noda
- Applicant: Mutsuo Nakashima , Yoshitaka Hamada , Katsuya Takemura , Kazumi Noda
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2006-264623 20060928
- Main IPC: C08F7/21
- IPC: C08F7/21 ; C08F7/08 ; G03F7/075
Abstract:
In a mixture of silsesquioxane compounds comprising silsesquioxane units having a side chain including a direct bond between a silicon atom and a norbornane skeleton and having a degree of condensation of substantially 100%, a dimethylene chain of the norbornane skeleton remote from the silicon bonded side is substituted with at least one substituent group other than hydrogen, and an isomer having a bulkier substituent group on the dimethylene chain at an exo position is present in a higher proportion.
Public/Granted literature
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