Invention Grant
US08153969B2 Inspection method and inspection system using charged particle beam
有权
使用带电粒子束的检查方法和检查系统
- Patent Title: Inspection method and inspection system using charged particle beam
- Patent Title (中): 使用带电粒子束的检查方法和检查系统
-
Application No.: US12323167Application Date: 2008-11-25
-
Publication No.: US08153969B2Publication Date: 2012-04-10
- Inventor: Atsuko Fukada , Mitsugu Sato , Naomasa Suzuki , Hidetoshi Nishiyama , Muneyuki Fukuda , Noritsugu Takahashi
- Applicant: Atsuko Fukada , Mitsugu Sato , Naomasa Suzuki , Hidetoshi Nishiyama , Muneyuki Fukuda , Noritsugu Takahashi
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Priority: JP2005-132528 20050428
- Main IPC: G01N23/00
- IPC: G01N23/00

Abstract:
In an electric immersion lens having high resolution capability, secondary electrons generated from a specimen are accelerated to suppress the dependency of rotational action of the secondary electrons applied thereto by an objective lens upon energy levels of the secondary electrons and when selectively detecting low and high angle components of elevation and azimuth as viewed from a secondary electron generation site by means of an annular detector interposed between an electron source and the objective lens, the secondary electrons are adjusted and deflected by means of an E×B deflector such that the center axis of secondary electrons converged finely under acceleration is made to be coincident with the center axis of a low elevation signal detection system and the secondary electrons are deviated from an aperture of a high elevation signal detection system.
Public/Granted literature
- US20090184255A1 INSPECTION METHOD AND INSPECTION SYSTEM USING CHARGED PARTICLE BEAM Public/Granted day:2009-07-23
Information query