Invention Grant
US08154065B2 Semiconductor memory devices including a vertical channel transistor having a buried bit line
有权
半导体存储器件包括具有埋入位线的垂直沟道晶体管
- Patent Title: Semiconductor memory devices including a vertical channel transistor having a buried bit line
- Patent Title (中): 半导体存储器件包括具有埋入位线的垂直沟道晶体管
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Application No.: US12418879Application Date: 2009-04-06
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Publication No.: US08154065B2Publication Date: 2012-04-10
- Inventor: Jae-man Yoon , Dong-gun Park , Choong-ho Lee , Moon-suk Yi , Chul Lee
- Applicant: Jae-man Yoon , Dong-gun Park , Choong-ho Lee , Moon-suk Yi , Chul Lee
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel Sibley & Sajovec
- Priority: KR10-2004-0090496 20041108
- Main IPC: H01L27/108
- IPC: H01L27/108

Abstract:
Semiconductor memory devices include a semiconductor substrate and a plurality of semiconductor material pillars in a spaced relationship on the semiconductor substrate. Respective surrounding gate electrodes surround ones of the pillars. A first source/drain region is in the semiconductor substrate between adjacent ones of the pillars and a second source/drain region is in an upper portion of at least one of the adjacent pillars. A buried bit line is in the first source/drain region and electrically coupled to the first source/drain region and a storage node electrode is on the upper portion of the at least one of the adjacent pillars and electrically contacting with the second source/drain region.
Public/Granted literature
- US20090189217A1 Semiconductor Memory Devices Including a Vertical Channel Transistor Public/Granted day:2009-07-30
Information query
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